摘要
Two-dimensional transition metal dichalcogenide nanoribbons are touted as the future extreme device downscaling for advanced logic and memory devices but remain a formidable synthetic challenge. Here, we demonstrate a ledge-directed epitaxy (LDE) of dense arrays of continuous, self-aligned, monolayer and single-crystalline MoS 2 nanoribbons on β-gallium (iii) oxide (β-Ga 2 O 3 ) (100) substrates. LDE MoS 2 nanoribbons have spatial uniformity over a long range and transport characteristics on par with those seen in exfoliated benchmarks. Prototype MoS 2 -nanoribbon-based field-effect transistors exhibit high on/off ratios of 10 8 and an averaged room temperature electron mobility of 65 cm 2 V −1 s −1 . The MoS 2 nanoribbons can be readily transferred to arbitrary substrates while the underlying β-Ga 2 O 3 can be reused after mechanical exfoliation. We further demonstrate LDE as a versatile epitaxy platform for the growth of p-type WSe 2 nanoribbons and lateral heterostructures made of p-WSe 2 and n-MoS 2 nanoribbons for futuristic electronics applications.