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Light-input tapered SiOx facet with InP crystallographic slope for InGaAsP-InGaAs-InP waveguide photodetectors
Journal article   Open access   Peer reviewed

Light-input tapered SiOx facet with InP crystallographic slope for InGaAsP-InGaAs-InP waveguide photodetectors

Chyi-Da Yang, Po-Hsun Lei and Meng-Chyi Wu
Journal of the Electrochemical Society, Vol.157(10)
2010

Abstract

A high speed waveguide photodetector (WGPD) integrated with a light input tapered SiO x facet that has high efficiency bandwidth product characteristics has been developed using the regrowth-free approach. This approach with monolithic integration is compared with standard processes. The typical excessive surface leakage current density was suppressed by more than 1 order of magnitude (from 115 to 7.4 mA/ cm 2 at -5 V), and the responsivity was increased from 0.4 to 0.75 A/W. The 7 μm oxide surrounding the WGPDs can be regarded as a SiO x waveguide in front of the absorption-region aperture and as a dielectric bonding pad capacitance. The proposed WGPD has a 3 dB bandwidth of 17 GHz with a responsivity of 0.75 A/W at a wavelength of 1.3 μm under 132.5 μW illuminations. © 2010 The Electrochemical Society.
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https://doi.org/10.1149/1.3459905View
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