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Low-concentration GaSb avalanche photodiodes grown by liquid-phase epitaxy using the compensation method
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Low-concentration GaSb avalanche photodiodes grown by liquid-phase epitaxy using the compensation method

Yuh-Maoh Sun, Jyh-Ming WangMeng-Chyi Wu
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 卷.34(12), 頁碼.L1579-L1580
1995

摘要

Avalanche photodiodes GaSb material Liquid-phase epitaxy
The fabricated GaSb mesa avalanche photodiodes exhibit good characteristics of low dark currents, low junction capacitances, and high breakdown voltages. The GaSb layers in these diodes, which have a low electron concentration of 4.3 X 10 15 cm -3 , were grown by liquid-phase epitaxy from Sb-rich solutions and by compensation using poly crystalline Te-doped GaSb in the growth solutions. © 1995 The Japan Society of Applied Physics.

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