摘要
The deposition of Al 2 O 3 on LiCoO 2 electrodes using a low-temperature atomic layer deposition has been investigated. Scanning electron microscopy confirms that Al 2 O 3 films can be homogeneously deposited on LiCoO 2 particles of porous electrodes at 120 °C. The results of X-ray photoelectron spectroscopy show that the Al 2 O 3 preferentially deposits on the LiCoO 2 . Furthermore, the results of cycling stability tests show that the cells with Al 2 O 3 -coated LiCoO 2 electrodes have enhanced performance. © 2010 Elsevier Ltd. All rights reserved.