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MOCVD growth of strained multiple quantum well structure for 1.3 μm InAsP/InP laser diodes
Journal article   Peer reviewed

MOCVD growth of strained multiple quantum well structure for 1.3 μm InAsP/InP laser diodes

Chong-Yi Lee, Meng-Chyi Wu, Hung-Pin Shiao, Tian-Tsorng Shi and Wen-Jeng Ho
Solid-State Electronics, Vol.43(12), pp.2141-2146
01/12/1999

Abstract

In this article, we describe the growth and characterization for 1.3 μm InAsP/InP strained multiple quantum well (SMQW) laser diodes (LDs) with separate confinement heterostructure grown at 580 °C by metalorganic chemical vapor deposition. The grown strained single quantum well (SSQW) stack and strained multiple quantum well (SMQW) structures are characterized using double-crystal X-ray diffraction and photoluminescence (PL) to confirm the structural and optical qualities for practical device applications. The InAsP/InP SSQW stack grown at 580 °C appears to be extremely abrupt, uniform, free of misfit dislocations and narrow PL half width. Although the InAsP/InP SMQWs grown at 580 °C maintain its structural integrity throughout the deposition sequence, the slightly broader PL half width for InAsP/InP SMQW structure is attributed to the dislocations resulted from a large net strain. Laser emission can be achieved by using the InAsP/InP SMQWs and the lasing wavelength is in a good agreement with our designed structure. The experimental data of broad-area and ridge waveguide LDs are described in detail.

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