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Manipulated transformation of filamentary and homogeneous resistive switching on ZnO thin film memristor with controllable multistate
Journal article   Peer reviewed

Manipulated transformation of filamentary and homogeneous resistive switching on ZnO thin film memristor with controllable multistate

Chi-Hsin Huang, Jian-Shiou Huang, Chih-Chung Lai, Hsin-Wei Huang, Su-Jien Lin and Yu-Lun Chueh
ACS Applied Materials and Interfaces, Vol.5(13), pp.6017-6023
10/07/2013

Abstract

memristor multistate storage nonvolatile memory ReRAM resistive switching ZnO
A bias polarity-manipulated transformation from filamentary to homogeneous resistive switching was demonstrated on a Pt/ZnO thin film/Pt device. Two types of switching behaviors, exhibiting different resistive switching characteristics and memory performances were investigated in detail. The detailed transformation mechanisms are systematically proposed. By controlling different compliance currents and RESET-stop voltages, controllable multistate resistances in low resistance states and a high resistance states in the ZnO thin film metal-insulator-metal structure under the homogeneous resistive switching were demonstrated. We believe that findings would open up opportunities to explore the resistive switching mechanisms and performance memristor with multistate storage. © 2013 American Chemical Society.

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