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Mechanically Robust Interface at Metal/Muscovite Quasi van der Waals Epitaxy
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Mechanically Robust Interface at Metal/Muscovite Quasi van der Waals Epitaxy

Jia-Wei Chen, Yun-Guan Wei, Hung-Yang Lo, SiCheng Lu, Yi-Che Chen, Chi-Fong Lei, Po-Liang Liu, Pu Yu, Nien-Ti Tsou, Akira Yasuhara, …
ACS applied materials & interfaces, 卷.15(40), 頁碼.47715-47724
11/10/2023
PMID: 37769228
Web of Science ID: WOS:001074991900001

摘要

Surfaces, Interfaces, and Applications
Quasi van der Waals epitaxy is an approach to constructing the combination of 2D and 3D materials. Here, we quantify and discuss the 2D/3D interface structure and the corresponding features in metal/muscovite systems. High-resolution scanning transmission electron microscopy reveals the atomic arrangement at the interface. The theoretical results explain the formation mechanism and predict the mechanical robustness of these metal/muscovite quasi van der Waals epitaxies. The evidence of superior interface quality is delivered according to the outstanding performance of the designed systems in both retention (>105 s) and cycling tests (>105 cycles) through electromechanical measurements. With high-temperature X-ray reciprocal space mapping, the unique anisotropy of thermal expansion is discovered and predicted to sustain the thermal stress with a sizable thermal actuation. A maximum bending curvature of 264 m–1 at 243 °C can be obtained in the silver/muscovite heteroepitaxy. The electrothermal and photothermal methods show a fast response to thermal stress and demonstrate the interface robustness.

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