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Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering
Journal article   Peer reviewed

Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

Chi-Tung Huang and Jenq-Gong Duh
Journal of Materials Science Letters, Vol.16(1), pp.59-61
1997

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