Microphotoluminescence and Microphotoreflectance Analyses of CO2 Laser Rapid-Thermal-Annealed SiOx Surface With Buried Si Nanocrystals

G.-R. Lin; C.-J. Lin; L.-J. Chou; Y.-L. Chueh

doi:10.1109/TNANO.2006.877426

Microphotoluminescence and Microphotoreflectance Analyses of CO2 Laser Rapid-Thermal-Annealed SiOx Surface With Buried Si Nanocrystals

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Microphotoluminescence and Microphotoreflectance Analyses of CO2 Laser Rapid-Thermal-Annealed SiOx Surface With Buried Si Nanocrystals

G.-R. Lin, C.-J. Lin, L.-J. Chou 和 Y.-L. Chueh

IEEE Transactions on Nanotechnology, 卷.5(5), 頁碼.511-516

11/09/2006

DOI: https://doi.org/10.1109/TNANO.2006.877426

摘要

CO2 laser annealing;microphotoluminescence;nanotechnology;Si nanocrystal;SiOx

The optical properties of a SiOx film rapid-thermal-annealed (RTA) by CO2 laser are primarily investigated. The microphotoluminescence (μ-PL) and high-resolution transmission electron microscopy (HRTEM) analyses indicate that the precipitation of random-oriented Si nanocrystals can be initiated when laser intensity (Plaser ) is larger than 4.5 kW/cm2 . At Plaser of 6kW/cm2 , the Si nanocrystal exhibits a largest diameter of 8 nm and a highest density of 4.5x1016 cm-3 , which emits strong PL at 790-825 nm. The microphotoreflectance of the CO2 laser RTA SiOx film reveals a volume density product dependent refractive index increasing from 1.57 to 1.87 as Plaser increases from 1.5 to 7.5 kW/cm2 . Nonetheless, the laser ablation of the SiOx film occurs with a linear ablation slope of 35 nm/kW/cm2 at beyond 7.5 kW/cm2 , which terminates the enlargement of Si nanocrystals, degrades the near-infrared PL, and slightly reduces the refractive index of the CO2 laser RTA SiOx film.

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題名: Microphotoluminescence and Microphotoreflectance Analyses of CO2 Laser Rapid-Thermal-Annealed SiOx Surface With Buried Si Nanocrystals
創作者：: G.-R. Lin (作者) - National Taiwan University
C.-J. Lin (作者) - National Yang Ming Chiao Tung University
L.-J. Chou (作者) - National Tsing Hua University
Y.-L. Chueh (作者) - National Tsing Hua University
學術資源類型: 期刊文章
出版日期: 11/09/2006
出版資訊: IEEE Transactions on Nanotechnology, 卷.5(5), 頁碼.511-516
語言: 英語

Microphotoluminescence and Microphotoreflectance Analyses of CO2 Laser Rapid-Thermal-Annealed SiOx Surface With Buried Si Nanocrystals

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