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Microstructure development of mechanical-deformation-induced Sn whiskers
Journal article   Open access   Peer reviewed

Microstructure development of mechanical-deformation-induced Sn whiskers

Shih-Kang Lin, Yuhi Yorikado, Junxiang Jiang, Keun-Soo Kim, Katsuaki Suganuma, Sinn-Wen Chen, Masanobu Tsujimoto and Isamu Yanada
Journal of Electronic Materials, Vol.36(12), pp.1732-1734
12/2007

Abstract

FIB Grain-boundary diffusion Microstructure Sn whiskers
The development of the microstructure of mechanical-deformation-induced Sn whiskers on electroplated films has been examined using a focused ion beam system (FIB). The 6-μm-thick matte Sn films were compressed by using a ZrO 2 ball indenter under ambient conditions. After compression, tin whiskers and small nodules were found adjacent to, and several grains further away from, the indents. The cross-sectional microstructures of the indents and whiskers indicate that the lateral boundaries of the newly created grains caused by recrystallization are the main routes for stress relaxation. © 2007 TMS.
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https://doi.org/10.1007/s11664-007-0284-4View
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