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Molecular-beam epitaxial growth of uniform Ga0.47In 0.53As with a rotating sample holder
Journal article   Peer reviewed

Molecular-beam epitaxial growth of uniform Ga0.47In 0.53As with a rotating sample holder

KEH-YUNG CHENG, A. Y. Cho and W. R. Wagner
Applied Physics Letters, Vol.39(8), pp.607-609
1981

Abstract

Ga 0.47 In 0.53 As and Al 0.48 In 0.52 As were grown lattice matched to InP substrates with a rotating substrate holder. The Ga, In, and Al beams were supplied by separate effusion cells and the uniformity of the resulting layers was evaluated with x-ray rocking curves for different rotation speeds. Lateral variation of the lattice constant as small as 10 -5 per cm may be achieved with a rotation speed of 3 rpm. The full width at half-maximum of the x-ray spectrum from the epitaxial layer is comparable to that of the substrate indicating that there is practically no compositional grading.

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