Nanometer-thick molecular beam epitaxy Al films capped with in situ deposited Al2O3—High-crystallinity, morphology, and superconductivity

Journal article

Journal of Applied Physics, Vol.136(7), p.074401

21/08/2024

Abstract

Superconductivity;Heterostructures;Crystal structure;Epitaxy;Thin Films;Superconducting quantum computing;Quantum computing INTRODUCTION

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Title: Nanometer-thick molecular beam epitaxy Al films capped with in situ deposited Al2O3—High-crystallinity, morphology, and superconductivity
Creators - without role: 晏詳林
Publication Details: Journal of Applied Physics, Vol.136(7), p.074401
Grant note: 國科會
Identifiers: 9957769979906774
Academic Unit: Department of Physics, College of Science, National Tsing Hua University
Language: English
Resource Type: Journal article