摘要
High entropy alloy (HEA) and highly nanotwinned (NT) material with improved ductility and high strength demonstrate promising potential compared to nanocrystalline materials and traditional metallic alloys. In this study, CoCrFeNi-based medium entropy alloy (MEA) thin films with nanotwinned structure (NT) was fabricated by sputtering technology and their corresponding properties and microstructure were investigated. The NT-MEA thin films show simple face centered cubic (FCC) structure with nearly 100% (111) texture and twin thickness in 1.8–2.8 nm. The NT-MEA thin films exhibit both low electrical resistivity (100 ± 2 μΩ-cm) and high hardness (8.0–9.15 GPa) with low roughness (Rms < 1.3 nm). By controlling the substrate bias, the residual stress of the CoCrFeNi thin film can be manipulated from compressive (−0.89 GPa) to tensile (+0.6 GPa) without scarifying the hardness.