Next-generation lithography

Journal article

Open access

Peer reviewed

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol.6(4), 040101

2007

Abstract

Electronic

Optical and Magnetic Materials

Atomic and Molecular Physics

and Optics

Condensed Matter Physics

Mechanical Engineering

Electrical and Electronic Engineering

url

https://doi.org/10.1117/1.2826725View

Published (Version of record) Open

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Title: Next-generation lithography
Translated title: Next-generation lithography
Creators - without role: Burn J. Lin - Taiwan Semiconductor Manufacturing Company (Taiwan)
Publication Details: Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol.6(4), 040101
Identifiers: 9957775998906774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Journal article