Abstract
A novel, facile, one-step Sn 4+ -based anodic deposition method was developed to flatten fluorine-doped tin oxide (FTO) layer, leading to a significant enhancement in visible light transmittances, from 79 to 85%. The Sn 2+ necessary for the anodic deposition of SnO 2 was generated in situ from the starting Sn 4+ such that a slow and balanced deposition and acid-etching of SnO 2 became possible. Furthermore, the fluoride ions released from the acid-etching of the starting FTO layer were later incorporated into the newly deposited SnO 2 to make it fluorine-doped, giving rise to the formation of the conductive, much flattened FTO layer. The flattening of the FTO layer led to a significant light scattering reduction at the FTO-air interface and thus enhanced the light transmittances. © The Royal Society of Chemistry 2013.