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Optical properties of amorphous SiO2-TiO2 multi-nanolayered coatings for 1064-nm mirror technology
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Optical properties of amorphous SiO2-TiO2 multi-nanolayered coatings for 1064-nm mirror technology

M. Magnozzi, S. Terreni, L. Anghinolfi, S. Uttiya, M.M. Carnasciali, G. Gemme, M. Neri, M. Principe, I. Pinto, L.-C. Kuo, …
Optical Materials, 卷.75, 頁碼.94-101
01/2018

摘要

Coatings Multilayer SiO2 thin film Spectroscopic ellipsometry TiO2 thin film Electronic Optical and Magnetic Materials Computer Science (all) Atomic and Molecular Physics and Optics Electrical and Electronic Engineering
The use of amorphous, SiO 2 -TiO 2 nanolayered coatings has been proposed recently for the mirrors of 3rd-generation interferometric detectors of gravitational waves, to be operated at low temperature. Coatings with a high number of low-high index sub-units pairs with nanoscale thickness were found to preserve the amorphous structure for high annealing temperatures, a key factor to improve the mechanical quality of the mirrors. The optimization of mirror designs based on such coatings requires a detailed knowledge of the optical properties of sub-units at the nm-thick scale. To this aim we have performed a Spectroscopic Ellipsometry (SE) study of amorphous SiO 2 -TiO 2 nanolayered films deposited on Si wafers by Ion Beam Sputtering (IBS). We have analyzed films that are composed of 5 and 19 nanolayers (NL 5 and NL 19 samples) and have total optical thickness nominally equivalent to a quarter of wavelength at 1064 nm. A set of reference optical properties for the constituent materials was obtained by the analysis of thicker SiO 2 and TiO 2 homogeneous films (∼ 120 nm) deposited by the same IBS facility. By flanking SE with ancillary techniques, such as TEM and AFM, we built optical models that allowed us to retrieve the broad-band (250–1700 nm) optical properties of the nanolayers in the NL 5 and NL 19 composite films. In the models which provided the best agreement between simulation and data, the thickness of each sub-unit was fitted within rather narrow bounds determined by the analysis of TEM measurements on witness samples. Regarding the NL 5 sample, with thickness of 19.9 nm and 27.1 nm for SiO 2 and TiO 2 sub-units, respectively, the optical properties presented limited variations with respect to the thin film counterparts. For the NL 19 sample, which is composed of ultrathin sub-units (4.4 nm and 8.4 nm for SiO 2 and TiO 2 , respectively) we observed a significant decrease of the IR refraction index for both types of sub-units; this points to a lesser mass density with respect to the thin film reference. The results are discussed in the light of the existing literature on nanofilms of amorphous oxides.

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