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Origin of Bias-Stress Induced Instability in Organic Thin-Film Transistors with Semiconducting Small-Molecule/Insulating Polymer Blend Channel
Journal article   Peer reviewed

Origin of Bias-Stress Induced Instability in Organic Thin-Film Transistors with Semiconducting Small-Molecule/Insulating Polymer Blend Channel

Ji Hoon Park, Young Tack Lee, Hee Sung Lee, Jun Young Lee, Kimoon Lee, Gyu Baek Lee, Jiwon Han, Tae Woong Kim and Seongil Im
ACS applied materials & interfaces, Vol.5(5), pp.1625-1629
13/03/2013
PMID: 23421395

Abstract

Materials Science Materials Science, Multidisciplinary Nanoscience & Nanotechnology Science & Technology Science & Technology - Other Topics Technology
The stabilities of a blending type organic thin-film transistor with phase-separated TIPS-pentacene channel layer were characterized under the conditions of negative-bias-stress (NBS) and positive-bias-stress (PBS). During NBS, threshold voltage (V-th) shifts noticeably. NBS-imposed devices revealed interfacial trap density-of-states (DOS) at 1.56 and 1.66 eV, whereas initial device showed the DOS at only 1.56 eV, as measured by photoexcited charge-collection spectroscopy (PECCS) method. Possible origin of this newly created defect is related to ester group in PMMA, which induces some hole traps at the TIPS-pentacene/i-PMMA interface. PBS-imposed device showed little V-th shift but visible off-current increase as "back-channel" effect, which is attributed to the water molecules trapped on the TFT surface.

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