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Partial epitaxial growth of cobalt germanides on (111)Ge
Journal article   Peer reviewed

Partial epitaxial growth of cobalt germanides on (111)Ge

Y.F. Hsieh, L.J. Chen, E.D. Marshall and S.S. Lau
Applied Physics Letters, Vol.51(20), pp.1588-1590
1987

Abstract

Localized epitaxial Co 5 Ge 7 and CoGe 2 have been grown in cobalt thin films on (111)Ge in the solid phase epitaxy regime. The orientation relationships between epitaxial germanides and the substrates as well as the configuration of the interfacial dislocations were analyzed by transmission electron microscopy (TEM) in detail. Surface morphology was examined by scanning electron microscopy. The results obtained from Read camera glancing angle x-ray diffraction and Rutherford backscattering channeling analysis were found to corroborate with those from TEM examinations.

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