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Performance and reliability trade-off of large-tilted-angle implant p-pocket on stacked-gate memory devices
Journal article

Performance and reliability trade-off of large-tilted-angle implant p-pocket on stacked-gate memory devices

Shih-Jye Shen, Hsin-Ming Chen, Chrong-Jung Lin, Hwi-Huang Chen, Gary Hong and Charles Ching-Hsiang Hsu
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol.36(7 A), pp.4289-4294
07/1997

Abstract

Channel hot electron injection Disturbance Large-tilted-angle implant p-pocket Punchthrough Snap-back Stacked-gate memory device Physics and Astronomy (miscellaneous) Engineering (all)
In this paper, the effects of large-tilted-angle p-pocket (LAP) implantation on the performance and reliability of stacked-gate memory cell are investigated. The utilization of LAP process achieves the improved programming efficiency and reduced punchthrough susceptibility. The 45° LAP cell featuring a fastest programming speed, however, would not be desirable due to the seriously aggravated read current degradation, drain/read disturbance, and early snap-back breakdown. The cells with 0° and 30° tilted angle are the feasible cells with the moderate programming performance and acceptable reliability constraints. Furthermore, the 0° LAP cell is preferred for the fact that it exhibits the desirable read current than that in 30° cell. Based on the cell performance and reliability consideration, the 0° p-pocket implanted cell is the optimal angle among 0°, 30° and 45° for the future scaling of stacked-gate memory cell.

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