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Plasmonic green nanolaser based on a metal-oxide-semiconductor structure
Journal article   Peer reviewed

Plasmonic green nanolaser based on a metal-oxide-semiconductor structure

Chen-Ying Wu, Cheng-Tai Kuo, Chun-Yuan Wang, Chieh-Lun He, Meng-Hsien Lin, Hyeyoung Ahn and Shangjr Gwo
Nano Letters, Vol.11(10), pp.4256-4260
12/10/2011

Abstract

indium gallium nitride nanoro Plasmonic nanolaser surface plasmon polariton
Realization of smaller and faster coherent light sources is critically important for the emerging applications in nanophotonics and information technology. Semiconductor lasers are arguably the most suitable candidate for such purposes. However, the minimum size of conventional semiconductor lasers utilizing dielectric optical cavities for sustaining laser oscillation is ultimately governed by the diffraction limit (∼(λ/2n) 3 for three-dimensional (3D) cavities, where λ is the free-space wavelength and n is the refractive index). Here, we demonstrate the 3D subdiffraction- limited laser operation in the green spectral region based on a metal-oxide-semiconductor (MOS) structure, comprising a bundle of green-emitting InGaN/GaN nanorods strongly coupled to a gold plate through a SiO 2 dielectric nanogap layer. In this plasmonic nanocavity structure, the analogue of MOS-type "nanocapacitor" in nanoelectronics leads to the confinement of the plasmonic field into a 3D mode volume of 8.0×10 -4 μ 3 (∼0.14(λ/2n) 3 ). © 2011 American Chemical Society.

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