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Profiling the local carrier concentration across a semiconductor quantum dot
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Profiling the local carrier concentration across a semiconductor quantum dot

J.C. Walrath, Yen-Hsiang Lin, S. HuangR.S. Goldman
Applied Physics Letters, 卷.106(19), 192101
05/2015

摘要

Physics and Astronomy (miscellaneous)
We profile the local carrier concentration, n, across epitaxial InAs/GaAs quantum dots (QDs) consisting of 3D islands on top of a 2D alloy layer. We use scanning thermoelectric microscopy to measure a profile of the temperature gradient-induced voltage, which is converted to a profile of the local Seebeck coefficient, S. The S profile is then converted to a conduction band-edge profile and compared with Poisson-Schrodinger band-edge simulations. Our combined computational-experimental approach suggests a reduced carrier concentration in the QD center in comparison to that of the 2D alloy layer. The relative roles of free carrier trapping and/or dopant expulsion are discussed.

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https://doi.org/10.1063/1.4919919檢視
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