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Raman spectroscopy study of Zn1-x Mnx Se thin films under high-pressure
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Raman spectroscopy study of Zn1-x Mnx Se thin films under high-pressure

Chih-Ming LinDer-San Chuu
Journal of Applied Physics, 卷.101(10), 103535
2007

摘要

Physics and Astronomy (all)
Raman spectroscopy was used to study phase transitions of substrate-free Zn1-x Mnx Se thin films, x=0.07, 0.17, and 0.29, under high pressure up around 20.0 GPa at ambient temperature. One Raman mode, transverse optical split mode, was observed before metallization at 2.9±1.0, 2.4±0.8, and 2.1±0.6 GPa for Zn0.71 Mn0.29 Se, Zn0.83 Mn0.17 Se, and Zn0.93 Mn0.07 Se thin films, respectively. The semiconductor-metallic transition pressure for Zn0.71 Mn0.29 Se, Zn0.83 Mn0.17 Se, and Zn0.93 Mn0.07 Se thin films was observed at 9.4±0.4, 10.9±0.6, and 11.7±0.2 GPa, respectively. It was found that the relation of the ionicity and the reduction of the pressure in transition from semiconductor to metal phase for Zn1-x Mnx Se thin films was not the same as that of bulk crystals. The percentage of the increasing of the Grüneison parameter of longitudinal optical mode for semiconductor to metal phase transition might be the important factor inherently related to the reduction of phase transition pressure for substrate-free Zn1-x Mnx Se thin film systems. © 2007 American Institute of Physics.

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