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Random and Systematic Variation in Nanoscale Hf0.5Zr0.5O2 Ferroelectric FinFETs: Physical Origin and Neuromorphic Circuit Implications
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Random and Systematic Variation in Nanoscale Hf0.5Zr0.5O2 Ferroelectric FinFETs: Physical Origin and Neuromorphic Circuit Implications

Sourav De, Md. Aftab Baig, Bo-Han Qiu, Franz Müller, Hoang-Hiep Le, Maximilian Lederer, Thomas Kämpfe, Tarek Ali, Po-Jung Sung, Chun-Jung Su, …
Frontiers in Nanotechnology, 卷.3, 826232
01/2022

摘要

ferroelectric finFET hafnium oxide neural networks non-volatile memory variation Electronic Optical and Magnetic Materials Atomic and Molecular Physics and Optics Biomedical Engineering Computer Science Applications Electrical and Electronic Engineering
This work presents 2-bits/cell operation in deeply scaled ferroelectric finFETs (Fe-finFET) with a 1 µs write pulse of maximum ±5 V amplitude and WRITE endurance above 10 9 cycles. Fe-finFET devices with single and multiple fins have been fabricated on an SOI wafer using a gate first process, with gate lengths down to 70 nm and fin width 20 nm. Extrapolated retention above 10 years also ensures stable inference operation for 10 years without any need for re-training. Statistical modeling of device-to-device and cycle-to-cycle variation is performed based on measured data and applied to neural network simulations using the CIMulator software platform. Stochastic device-to-device variation is mainly compensated during online training and has virtually no impact on training accuracy. On the other hand, stochastic cycle-to-cycle threshold voltage variation up to 400 mV can be tolerated for MNIST handwritten digits recognition. A substantial inference accuracy drop with systematic retention degradation was observed in analog neural networks. However, quaternary neural networks (QNNs) and binary neural networks (BNNs) with Fe-finFETs as synaptic devices demonstrated excellent immunity toward the cumulative impact of stochastic and systematic variations.

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