Abstract
Real-time feedback control of plasma density has the potential to enhance the process reliability of VLSI fabrication. This potential is demonstrated in an inductively coupled plasma using the proportional-integral-differential algorithm.
- Title
- Real-time feedback control of plasma density in inductively coupled plasmas
- Creators - without role
- C.H. Chang - Natl Tsing Hua UnivK.C. Leou - Natl Tsing Hua UnivC. Lin - Natl Tsing Hua Univ
- Grant note
- IEEE Nuclear and Plasma Science Society
- Identifiers
- 9957772726106774
- Academic Unit
- Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
- Language
- English
- Resource Type
- Journal article
- Publication Details
- IEEE International Conference on Plasma Science, p.89