Logo image
Back
Refractive index variation of amorphous Ta2O5 film fabricated by ion beam sputtering with RF bias power
Journal article   Peer reviewed

Refractive index variation of amorphous Ta2O5 film fabricated by ion beam sputtering with RF bias power

Chen Yang Huang, Hao Min Ku, Yi Ping Tsai, Wei Kai Chen and Shiuh Chao
Optical Review, Vol.16(3), pp.274-275
05/2009
DOI: https://doi.org/10.1007/s10043-009-0051-2

Abstract

Ion beam sputtering Refractive index RF bias power Tantalum pentoxide
Ta 2 O 5 film was fabricated by ion beam sputtering with RF bias applied to the substrate. The refractive index in the visible range of the film can be controlled to vary linearly with the RF bias power while low absorption is maintained. © 2009 The Optical Society of Japan.

Metrics

1 Record Views

Details

Logo image