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Rollable Silicon IC Wafers Achieved by Backside Nanotexturing
Journal article   Peer reviewed

Rollable Silicon IC Wafers Achieved by Backside Nanotexturing

Kunal Kashyap, Long-Chia Zheng, Dong-Yan Lai, Max T. Hou and J. Andrew Yeh
IEEE Electron Device Letters, Vol.36(8), pp.829-831
01/08/2015

Abstract

carrier charge mobility Flexible silicon ICs mechanical strength p-MOSFETs silicon nanotextures
This letter presents a wafer-level approach for producing rollable single-crystal silicon integrated circuit (IC) wafers, bent with a 17-mm minimum radius of curvature, achieved by backside nanotexturing. The three-point bending test indicates a mechanical strength enhancement by a factor of 2.3 for nanotextured 60-μ m thick samples. The minimum radius of curvature decreased by 43.4%, exhibiting improved flexibility. The carrier charge mobility increases by 4.9%, 12.6%, and 16.9% for the bending radii of 45, 30, and 24 mm, respectively. The increment of the mobility corresponds with the changing compressive stress in p-MOSFETs fabricated on the IC wafer.

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