Simulation of optical projection with polarization-dependent stray light to explore the difference between dry and immersion lithography

Journal article

Journal of Microlithography Microfabrication and Microsystems, Vol.3, pp.9-20

2004

Abstract

Optical lithography;immersion lithography;polarized illumination;polarized imaging

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Title: Simulation of optical projection with polarization-dependent stray light to explore the difference between dry and immersion lithography
Creators - without role: 本堅林
Publication Details: Journal of Microlithography Microfabrication and Microsystems, Vol.3, pp.9-20
Identifiers: 9957767525606774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Journal article