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Single domain m-plane ZnO grown on m-plane sapphire by radio frequency magnetron sputtering
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Single domain m-plane ZnO grown on m-plane sapphire by radio frequency magnetron sputtering

B.H. Lin, W.-R. Liu, C.Y. Lin, S.T. Hsu, S. Yang, C.C. Kuo, C.-H. Hsu, W.F. Hsieh, F.S.-S. ChienC.S. Chang
ACS Applied Materials and Interfaces, 卷.4(10), 頁碼.5333-5337
10/2012

摘要

non-polar ZnO RF-magnetron sputtering strain structural defects Materials Science (all)
High-quality m-plane orientated ZnO films have been successfully grown on m-plane sapphire by using radio frequency magnetron sputtering deposition. The introduction of a nanometer-thick, low-temperature-grown ZnO buffer layer effectively eliminates inclusions of other undesirable orientations. The structure characteristics of the ZnO epi-layers were thoroughly studied by synchrotron X-ray scattering and transmission electron microscopy (TEM). The in-plane epitaxial relationship between ZnO and sapphire follows (0002) ZnO ∥ (112̄0) sapphire and (112̄0) ZnO ∥ (0006) sapphire and the ZnO/sapphire interface structure can be described by the domain matching epitaxy along the [112̄0] ZnO direction. The vibrational properties of the films were investigated by polarization dependent micro-Raman spectroscopy. Both XRD and micro-Raman results reveal that the obtained m-ZnO layers are under an anisotropic biaxial strain but still retains a hexagonal lattice. © 2012 American Chemical Society.

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