摘要
Smooth spin-on mesoporous silica films with controlled thickness and hydrophobicity were synthesized. It was found that in-situ derivatization of the precursor solution effectively eliminates silanol groups and increase the hydrophobicity of the film. In particular, ultralow dielectric constants of 1.42 to 2.50 can be obtained for the in-situ derivatized spin-on mesoporous silica films.