Logo image
Structural characteristics of nanometer thick Gd2O3 films grown on GaN (0001)
Journal article   Peer reviewed

Structural characteristics of nanometer thick Gd2O3 films grown on GaN (0001)

W.H. Chang, P. Chang, T.Y. Lai, Y.J. Lee, J. Kwo, C.-H. Hsu and M. Hong
Crystal Growth and Design, Vol.10(12), pp.5117-5122
01/12/2010

Abstract

High-quality Gd <sub>2</sub> O <sub>3</sub> epi-films 5-20 nm thick have been grown on GaN (0001) using molecular beam epitaxy. A detailed structural investigation was carried out by in situ reflection high energy electron diffraction, cross sectional transmission electron microscopy, and X-ray scattering using a synchrotron radiation source. The films consist of the high-temperature monoclinic (m) phase with six rotational domains, which can be easily mistaken for being the hexagonal phase. All the domains follow the m-Gd <sub>2</sub> O <sub>3</sub> (2̄01)<020> ∥ GaN (0001)<112̄0> orientational relationship. © 2010 American Chemical Society.

Metrics

1 Record Views

Details

Logo image