Abstract
Various x-ray techniques have been applied to a study of semiconductor superlattices consisting of 100-period of In x Ga 1-x As (15 Å)/GaAs (100 Å) grown on GaAs(100) substrates by molecular beam epitaxy. Structural parameters pertaining to the morphology of interfaces and thickness variations were obtained. The interfaces in these superlattices are found to be highly correlated, and the layers all show a high degree of crystallinity. Splittings in the x-ray reflectivity and diffraction patterns in one of the samples provide clear evidence for pronounced thickness modulation, and direct comparison of the diffraction satellite peaks with results of high resolution transmission electron microscopy indicates that there exists a lateral structural ordering in the [110] direction during epitaxial growth. © 1996 American Institute of Physics.