Abstract
Two high-entropy alloy nitride films, (Al 23.1 Cr 30.8 Nb 7.7 Si 7.7 Ti 30.7 )N 50 and (Al 29.1 Cr 30.8 Nb 11.2 Si 7.7 Ti 21.2 )N 50 , were designed and prepared by reactive magnetron sputtering. The influences of substrate bias (from -50V to -150V) on chemical composition, microstructure, and mechanical properties of the deposited films were investigated. All the films have face-centered cubic NaCl-type structure. The (Al 23.1 Cr 30.8 Nb 7.7 Si 7.7 Ti 30.7 )N x films deposited at -100V exhibit the highest hardness of 36.1GPa, and the (Al 29.1 Cr 30.8 Nb 11.2 Si 7.7 Ti 21.2 )N x films have its maximum hardness of 36.7GPa at a substrate bias of -150V. Both (Al 23.1 Cr 30.8 Nb 7.7 Si 7.7 Ti 30.7 )N x and (Al 29.1 Cr 30.8 Nb 11.2 Si 7.7 Ti 21.2 )N x films have outstanding oxidation resistance at 900°C. © 2013 Elsevier B.V.