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Structure of epitaxial Gd2O3 films grown on GaAs(100)
Journal article   Open access   Peer reviewed

Structure of epitaxial Gd2O3 films grown on GaAs(100)

A.R. Kortan, M. Hong, J. Kwo, J.P. Mannaerts and N. Kopylov
Physical Review B - Condensed Matter and Materials Physics, Vol.60(15), pp.10913-10918
1999

Abstract

Single-crystal Gd 2 O 3 films were grown epitaxially on GaAs(100) substrate. From the single-crystal momentum space analysis on four different samples, 185, 45, 25, and 18 Å thick, a Mn 2 O 3 isomorphous cubic structure is identified. The Gd 2 O 3 film aligns its twofold (110) axis with the fourfold (100) surface normal of the substrate, while aligning its [001] and [110] axes with the [011] and [011] axes of GaAs within the plane, respectively. The absence of the other possible twofold growth orientation can be explained by the bonding configuration at the interface. The 18- and 25-Å-thick samples show an elastically strained component in the film, while thicker samples appear fully relaxed, probably through misfit dislocation formation. ©1999 The American Physical Society.
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