Study of Co thin films deposited on low-index Cu surfaces by photoemission electron microscopy

Yuet-Loy Chan; Jo-Hsuan Sun; Y.J. Hsu; D.H. Wei

doi:10.1016/j.jmmm.2006.01.189

Study of Co thin films deposited on low-index Cu surfaces by photoemission electron microscopy

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Study of Co thin films deposited on low-index Cu surfaces by photoemission electron microscopy

Yuet-Loy Chan, Jo-Hsuan Sun, Y.J. Hsu 和 D.H. Wei

Journal of Magnetism and Magnetic Materials, 卷.304(1)

09/2006

DOI: https://doi.org/10.1016/j.jmmm.2006.01.189

摘要

Magnetic domain

Photoemission electron microscope

X-ray magnetic circular dichroism

Electronic

Optical and Magnetic Materials

Condensed Matter Physics

The domain structures of Co ultrathin film prepared with μm- and mm-dimension laterally were acquired and compared using X-ray Photoemission Electron Microscope (PEEM). Through depositing the Co film with different thickness on two copper single-crystal surfaces; Cu(1 0 0) and Cu(1 1 0), we report the impacts of thin film lateral dimensions, crystal orientations, and film thickness to the domain structures of Co layer. © 2006 Elsevier B.V. All rights reserved.

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題名: Study of Co thin films deposited on low-index Cu surfaces by photoemission electron microscopy
創作者：: Yuet-Loy Chan (作者) - National Synchrotron Radiation Research Center
Jo-Hsuan Sun (作者) - National Synchrotron Radiation Research Center
Y.J. Hsu (作者) - National Synchrotron Radiation Research Center
D.H. Wei (作者) - National Synchrotron Radiation Research Center
學術資源類型: 期刊文章
出版日期: 09/2006
出版資訊: Journal of Magnetism and Magnetic Materials, 卷.304(1)
語言: 英語

Study of Co thin films deposited on low-index Cu surfaces by photoemission electron microscopy

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