Logo image
Submicron imprint of trench structures by external and intrinsic electromagnetic force
Journal article   Peer reviewed

Submicron imprint of trench structures by external and intrinsic electromagnetic force

H. Hocheng and T.T. Wen
CIRP Annals - Manufacturing Technology, Vol.59(1), pp.263-266
2010

Abstract

Miniaturization Nano manufacturing Submicron imprint
This paper describes a novel method for replication of submicron trench features by intrinsic electromagnetic imprinting force derived from the material made by mixing nanosize ferrite powders into ultraviolet-curable polymer, leading to the advantages of good uniformity and reduced structural deformation compared to mechanical nanoimprint methods. The features are fabricated to 0.5 μm wide and 0.2 μm high under the ultraviolet curing of 480 mJ/cm 2 , imprinting cycle time of 30 s and pressure as low as 0.92 kg f /cm 2 . The imprinting technique possesses the potential for fabrication of submicron magnetic features at room temperature across large area with high production rate and good pattern fidelity. © 2010 CIRP.

Metrics

1 Record Views

Details

Logo image