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Temperature-insensitive photoluminescence above 300 K in strained GaxIn1-x As multiple quantum wire heterostructures
Journal article   Peer reviewed

Temperature-insensitive photoluminescence above 300 K in strained GaxIn1-x As multiple quantum wire heterostructures

D. E. Wohlert, S. T. Chou and KEH-YUNG CHENG
Journal of Crystal Growth, Vol.175-176(PART 2), pp.1162-1166
05/1997

Abstract

MBE Multi-axial strain PL PPL QWR SILO
Stable peak wavelength photoluminescence (PL) spectra has been observed in Ga x In 1-x As strained multiple quantum wire (MQWR) heterostructures over a temperature range between 250 and 380 K. The MQWR samples were grown in situ by molecular beam epitaxy using the strain-induced lateral-layer ordering (SILO) process to create the quantum wires. The formation of the strained Ga x In 1-x As quantum wires and the amount of the strain associated with the wires depends on the growth conditions and structural configuration of the MQWR active region. Samples grown near a substrate temperature of 500°C show a negligible net PL peak wavelength shift between 77 and 380 K. Red shifts and blue shifts of PL peak wavelengths between 77 and 380 K are observed in samples grown at temperatures less than and greater than 500°C, respectively. Due to the multi-axial strain fields induced by the SILO process in the MQWR active regions, the PL peak wavelength of all the MQWR samples stabilize at ∼ 1.61 μm for temperatures above 250 K. The temperature dependent shift of peak PL wavelength between room temperature and 72°C for these MQWR heterostructures is as low as 0.2 Å/°C.

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