Thermal poling and ultraviolet erasure characteristics of type-III ultraviolet-grade fused silica and application to periodic poling on planar substrates

Huai-Yi Chen; Jin-Sheng Sue; Yi-Hsuan Lin; Chin-Shun Tsai; Pao-Tung Wu; Shiuh Chao

doi:10.1063/1.1591076

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Thermal poling and ultraviolet erasure characteristics of type-III ultraviolet-grade fused silica and application to periodic poling on planar substrates

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Thermal poling and ultraviolet erasure characteristics of type-III ultraviolet-grade fused silica and application to periodic poling on planar substrates

Huai-Yi Chen, Jin-Sheng Sue, Yi-Hsuan Lin, Chin-Shun Tsai, Pao-Tung Wu and Shiuh Chao

Journal of Applied Physics, Vol.94(3), pp.1531-1538

01/08/2003

DOI: https://doi.org/10.1063/1.1591076

Appears in keyword about Physics

Abstract

The characteristics of type-III ultraviolet-grade fused silica based on thermal poling and ultraviolet erasure were investigated. The second-order nonlinearity of the thermally poled silica was studied by correlating it with a buried Gaussian function. The etching rate of the thermally poled and unpoled fused silica was found to be the same but was different along different directions.

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Title: Thermal poling and ultraviolet erasure characteristics of type-III ultraviolet-grade fused silica and application to periodic poling on planar substrates
Creators - without role: Huai-Yi Chen - Department of Electrical Engineering , National Tsing Hua University
Jin-Sheng Sue - National Tsing Hua University
Yi-Hsuan Lin - Department of Electrical Engineering , National Tsing Hua University
Chin-Shun Tsai - National Tsing Hua University
Pao-Tung Wu - National Tsing Hua University
Shiuh Chao - National Tsing Hua University
Identifiers: 9957766524406774
Academic Unit: College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Journal article
Publication Details: Journal of Applied Physics, Vol.94(3), pp.1531-1538

Thermal poling and ultraviolet erasure characteristics of type-III ultraviolet-grade fused silica and application to periodic poling on planar substrates

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