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TiO2-SiO2 mixed films prepared by the fast alternating sputter method
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TiO2-SiO2 mixed films prepared by the fast alternating sputter method

Shiuh Chao, Cheng-Kuei ChangJyh-Shin Chen
Applied Optics, 卷.30(22), 頁碼.3233-3237
1991

摘要

We introduced the fast alternating sputter method and its application on deposition of TiO 2 -SiO 2 mixed films. By using fast alternating sputter, the TiO 2 and SiO 2 were completely mixed in the film, and no thin- pair structure could be found by x-ray diffraction. The structure of the mixed films was amorphous in a wide composition range. The optical properties of the mixed films in the visible and near infrared changed from SiO 2 -dominant to TiO 2 -dominant as TiO 2 content in the film increased. © 1991 Optical Society of America.

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