摘要
Designing an efficient emitter design is an important step for achieving a highly efficient TPV conversion process. Wavelength-selective emissivity, spectra match between the emitter and TPV cells, and high thermal stability are three main characteristics that must be considered before implementing the emitter. In this work, an indium tin oxide (ITO)/sapphire emitter structure is investigated for TPV application over the temperature range from 200°C to 1000°C. A 1-µm-thick ITO layer is deposited on a 650-µm-thick sapphire substrate. In addition, 50-nm-thick SiO 2 is deposited on top of the ITO to enhance the performance of emitter at high temperatures. High-temperature emissivity and absorptivity measurement of the emitter samples are obtained using FTIR and a Hitachi U-4100 spectrophotometer, respectively. The resultant SiO 2 /ITO/sapphire/stainless-steel planar emitter structure has selective emission with high emissivity of ~0.8 in the 1-1.6 µm wavelength regime at 1000°C. This emission range lies at the bandgap edge of silicon TPV cells and thus can be used to harness the true potential for making a low-cost thermophotovoltaic system.