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Ultrafast carrier thermalization in InN
Journal article   Open access   Peer reviewed

Ultrafast carrier thermalization in InN

Yu-Chieh Wen, Cheng-Ying Chen, Chang-Hong Shen, Chang-Hong Shen, Shangjr Gwo and Chi-Kuang Sun
Applied Physics Letters, Vol.89(23), 232114
2006

Abstract

Carrier thermalization dynamics in heavily doped n -type InN was investigated at room temperature with a femtosecond transient transmission measurement. The dependence of hot carrier cooling time on the total electron density indicates that the plasma screening of electron-LO phonon interactions is responsible for the reduction in energy-loss rate. Under low excitation, the carriers with different excess energies can be found to cool down with a fixed thermalization time of 1.4 ps. Intensity dependent study suggests that this relatively slow carrier cooling time could be attributed to the screening effect by high-background-doping plasma rather than the hot phonon effect. © 2006 American Institute of Physics.
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