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Using photoelectron emission microscopy with hard-X-rays
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Using photoelectron emission microscopy with hard-X-rays

Y. Hwu, W.L. Tsai, B. Lai, J.H. Je, G.H. Fecher, M. BertoloG. Margaritondo
Surface Science, 卷.480(3), 頁碼.188-195
06/2001

摘要

Photoelectron emission X-ray absorption spectroscopy Condensed Matter Physics Surfaces and Interfaces Surfaces Coatings and Films Materials Chemistry
We present several successful test cases of using photoelectron emission microscopy (PEEM) for photon energy up to 25 keV. First, the full extended X-ray absorption fine structure analysis was implemented in areas as small as 100 μm 2 for transition-metal K edge absorption spectra and, therefore, demonstrated the feasibility of combining structural and chemical analysis with hard-X-ray absorption spectroscopy with high lateral resolution. We also show that PEEM can be used in a transmission (radiography) mode as an imaging detector for hard-X-ray. This approach again leads to the unprecedented 0.3 μm lateral resolution, particularly critical for the use of coherence-based phase contrast techniques in real time X-ray radiology. © 2001 Elsevier Science B.V.

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