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XAS and TEM studies on ferromagnetic GeMn prepared by Mn ion implantation and helium ion beam induced epitaxial crystallization
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XAS and TEM studies on ferromagnetic GeMn prepared by Mn ion implantation and helium ion beam induced epitaxial crystallization

Tung Yuan Hsiao, ChienHsu Chen, Jaw-Wern Chiou 和 Huan Niu
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 卷.447, 頁碼.34-37
15/05/2019
Web of Science ID: WOS:000468716100005

摘要

Diluted magnetic semiconductors Extended X-ray absorption fine structure Implantation X-and ray absorption spectrum
In this study, we prepared a p-type Ge thin film and then implanted Mn ions in it at room temperature. P-type Ge thin film was made by gallium ion implantation in to an n-type Ge substrate to provide additional hole carriers. Mn ions were implanted into the same layer with Ga ions. Helium ion beam induced epitaxial crystallization with 2 MeV was used to growth GeMn thin films. The results show the beam annealed GeMn sample has been regrowth and has magnetoresistance.

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