摘要
The single step method for electroless Ni-deposition induced by intense x ray from synchrotron was reported. As such, the variation of electrolyte pH gave interesting results on changes in Ni reduction time and the nucleation density on glass. By irradiating electrolytes with intense x ray the onset time for Ni reduction disappears at high electrolyte pH (>6.0) in sharp contrast with conventional electroless deposition.