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OPTICAL EVIDENCE FOR AN ELECTRONIC PHASE TRANSITION AT THE Co-Si INTERFACE.
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OPTICAL EVIDENCE FOR AN ELECTRONIC PHASE TRANSITION AT THE Co-Si INTERFACE.

A.B. Buckman and S. Chao
Journal of the Optical Society of America, Vol.71(8), pp.928-931
08/1981

Abstract

Ellipsometry on a series of Co-Si interfaces, for which the equivalent polycrystalline Co deposits differ by only a few monolayers, demonstrates that a large decrease in refractive index of the glassy surface layer occurs quite sharply at Co deposits slightly less than the amount necessary to effect the semiconductor-metal transition observed with dc temperature coefficient-of-resistance measurements at 100 K. This observed behavior of the optical constants of the glassy layer can be interpreted by using a simple model for the optical-frequency polarizability of a localized electron state with a phenomenological localization parameter, which decreases with increasing Co deposit.
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