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Device With Engineered Epitaxial Region And Methods Of Making Same
Patent

Device With Engineered Epitaxial Region And Methods Of Making Same

Taiwan Semiconductor Manufacturing Company, Ltd., 黃敬源, Su, Chien-Chang, Pai, Yi-Fang, Lu, Chia-Yu, Lin, Yen-Chun and Lin, Da-Wen
17/12/2015

Abstract

A device includes a substrate and a recess in the substrate. The recess has a bottom and sidewalls. The device also includes a first epitaxial layer over the bottom of the recess, and a second epitaxial layer over the first epitaxial layer and over the sidewalls of the recess, the second epitaxial layer having a different lattice constant than the substrate. The device further includes a third epitaxial layer over the second epitaxial layer and filling the recess.

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