Full Sized Scattering Bar Alt-PSM Technique for IC Manufacturing in Sub-Resolution Era

Patent

Full Sized Scattering Bar Alt-PSM Technique for IC Manufacturing in Sub-Resolution Era

26/07/2002

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Title: Full Sized Scattering Bar Alt-PSM Technique for IC Manufacturing in Sub-Resolution Era
Creators - without role: 林本堅
Identifiers: 9957787816406774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Patent
Date application: 26/07/2002