摘要
A film growth process equipment including a main chamber and an illumination device is provided. The illumination device includes a light source, a transparent layer, and a van der Waals material layer. The transparent layer includes a light-emitting surface away from the light source. The van der Waals material layer has a defect concentration lower than 1012 cm−2, and is disposed on the light-emitting surface of the transparent layer. The van der Waals material layer is formed as a portion of an inner surface of the main chamber.