摘要
A method for implementing a thin film deposition process includes: transporting a substrate(60) into a first chamber(10); feeding a precursor into the first chamber(10), the precursor being adsorbed on a top surface(62) of the substrate(60); supplying radiant energy to at least a part of the top surface(62) of the substrate(60) to facilitate reaction between the precursor and the top surface(62) of the substrate(60); transporting the substrate(60) with the top surface(62) being precursor-adsorbed into a second chamber(50) that is separated from the first chamber(10) and that is spatially isolated from the first chamber(10); feeding a reactant into the second chamber(50), wherein reaction between the reactant and the precursor results in a thin film forming on the top surface(62).