- Title
- Method Of Using A O-quinone Diazide Sensitized Phenol- formaldehyde Resist As A Deep Ultraviolet Light Exposure Mask
- Creators - without role
- 林本堅
- Identifiers
- 9957787965406774
- Academic Unit
- Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
- Language
- Traditional Chinese
- Resource Type
- Patent
- Date application
- 30/12/1977
Patent
Method Of Using A O-quinone Diazide Sensitized Phenol- formaldehyde Resist As A Deep Ultraviolet Light Exposure Mask
30/12/1977
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