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Method and system of revising a layout diagram
專利

Method and system of revising a layout diagram

Sheng-Hsiung Chen, Wai-Kei Mak, Ding-Wei Huang, Yu-Hsiang Cheng, Ting-Chi Wang 和 Meng-Kai Hsu
15/09/2020

摘要

APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES Holography Photography Physics
A method (of generating a layout diagram) includes: identifying, in the layout diagram, a group of three or more cells which violates a horizontal constraint vector (HCV) and is arranged so as to exhibit two or more vertically-aligned edge-pairs (VEPs); each VEP including two members representing at least partial portions of vertical edges of corresponding cells of the group; relative to a horizontal direction, the members of each VEP being disposed in edgewise-abutment and separated by a corresponding actual gap; and the HCV having separation thresholds, each of which has a corresponding VEP and represents a corresponding minimum gap in the horizontal direction between the members of the corresponding VEP; and for each of at least one but fewer than all of the separation thresholds, selectively moving a given one of cells corresponding to one of the members of the corresponding VEP thereby to avoid violating the HCV.

相關連結

指標

1 檢視次數

詳細資料

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